We at the University of Colorado are lucky enough to have the American Vacuum Society's ALD conference and ALE workshop hosted here in Colorado. The George group will have a strong presence this year with three posters and eight oral presentations by current group members(not to mention those given by group alums)! Here's the schedule of George group talks:
Saturday | Atomic Layer Etching Poster Session, 6 pm
Joel Clancey,In Situ Mass Spectrometer Studies of Volatile Etch Products During Thermal Al2O3 Atomic Layer Etching Using HF and Trimethylaluminum
David Zywotko,Thermal Atomic Layer Etching of ZnO by “Conversion-Etch” Using Hydrogen Fluoride and Trimethylaluminum
Jonas Gertsch,SF4 as a New Fluorine Reagent for Thermal ALE: Application to Al2O3 and VO2 ALE
Sunday
Steven M. George,2:00 pm, Atomic Layer Etching Session I,Thermal Atomic Layer Etching of SiO2 by a “ConversionEtch” Mechanism
Monday
Younghee Lee, 8:00 am, Atomic Layer Etching Session III,Selectivity in Thermal Atomic Layer Etching (INVITED)
Nicholas Johnson, 11:15 am, Atomic Layer Etching Session III, WO3 and W Thermal Atomic Layer Etching Using “Conversion-Fluorination” and “Oxidation-Conversion-Fluorination” Etching Mechanisms
Tommi Kääriäinen, 11:45 am, ALD Fundamentals: Emerging Applications,Improving Processability of Poorly Flowing Pharmaceutical Powders by Atomic Layer Deposition
Jaclyn Sprenger, 4:00 pm, ALD Fundamentals: Process Development,Boron Nitride Growth at Room Temperature Using Electron Enhanced Atomic Layer Deposition (EE-ALD)
Tuesday
Alexander Yersak, 9:00 am, ALD Applications: Batteries I,Comparing Temporal and Spatial Atomic Layer Deposition for Enhanced Performance of Li Ion Battery Electrodes
Andrew Cavanagh, 2:30 pm, ALD for Manufacturing,Growth Rates During Silicon Spatial ElectronEnhanced Atomic Layer Deposition: Role of Dangling Bond Lifetime
Jasmine Wallas, 2:45 pm, ALD Applications: Batteries II,Improving Interfacial Stability of Sulfide-Based LithiumIon-Conducting Solid Electrolytes with ALD
Find the full ALD2017 schedule and look for us at the conference!